Sputter Deposition System (SDS)

Principal Investigator: Dr. Paul Holloway

Used for fabricating electroluminescent phosphors (visible as well as infrared). It is primarily an RF magnetron sputtering too, although it is also capable of ion-beam sputter deposition with ion-beam assist and evaporation. Currently, it is primarily used for the deposition of rare earth doped (Nd, Er, Tm, Dy) ZnS thin films as efficient IR emitters. The process is performed within a vacuum chamber with the substrates on the bottom and targets with the film material hanging above. Argon gas is inserted into the chamber where an electric field between the substrates and the target generate a plasma which sputters the target material onto the substrate where they form a thin film. We have the capability of co-sputtering with three individually controlled guns to modify the film chemistry.

For more information, contact Dr. Mark Davidson: (352) 846-2083.

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